"A Three-Dimensional Photoresist Imaging Process Simulator for Strong ..."

Akemi Moniwa et al. (1987)

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DOI: 10.1109/TCAD.1987.1270289

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type: Journal Article

metadata version: 2020-09-24

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Akemi Moniwa, Toshiharu Matsuzawa, Tetsuo Ito, Hideo Sunami:
A Three-Dimensional Photoresist Imaging Process Simulator for Strong Standing-Wave Effect Environment. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 6(3): 431-438 (1987)

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