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"Total-dose-induced edge effect in SOI NMOS transistors with different layouts."

Name: dblp XML data dump
Creator: Schloss Dagstuhl - Leibniz Center for Informatics
Published: 1993
License: https://creativecommons.org/publicdomain/zero/1.0/
Keywords: dblp, XML, computer science, scholarly publications, metadata

Jie Liu et al. (2010)

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DOI: 10.1016/J.MICROREL.2009.09.003

access: closed

type: Journal Article

metadata version: 2020-02-22

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  dblp key:
  - journals/mr/LiuZLKESH10
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  - https://dblp.org/rec/journals/mr/LiuZLKESH10
Jie Liu, Jicheng Zhou, Hongwei Luo, Xuedong Kong, Yunfei En, Qian Shi, Yujuan He:
Total-dose-induced edge effect in SOI NMOS transistors with different layouts. Microelectron. Reliab. 50(1): 45-47 (2010)

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