"Effect of additive N2 and Ar gases on surface smoothening and ..."

W. Heo, Nae-Eung Lee (2012)

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DOI: 10.1016/J.MICROREL.2011.09.017

access: closed

type: Journal Article

metadata version: 2020-10-28

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W. Heo, Nae-Eung Lee:
Effect of additive N₂ and Ar gases on surface smoothening and fracture strength of Si wafers during high-speed chemical dry thinning. Microelectron. Reliab. 52(2): 412-417 (2012)

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