"Retention Characteristics Dependent on High-κ Gate-Insulator Stack in ..."

Gyoungyeop do et al. (2024)

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DOI: 10.1109/ACCESS.2024.3498903

access: open

type: Journal Article

metadata version: 2024-11-30

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Gyoungyeop do, Danyoung Cha, Kunhee Tae, Nayeong Lee, Seokhyun Byun, Jeongseok Pi, Sungsik Lee:
Retention Characteristics Dependent on High-κ Gate-Insulator Stack in Hf-ZnO Synaptic Thin-Film Transistors. IEEE Access 12: 170570-170580 (2024)

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