"Unveiling Cryogenic Performance (4 to 300 K) Towards Ultra-Thin ..."

Dong Zhang et al. (2024)

> Home

Details and statistics

DOI: 10.1109/VLSITECHNOLOGYANDCIR46783.2024.10631318

access: closed

type: Conference or Workshop Paper

metadata version: 2025-07-31

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/vlsit/ZhangFZSKLZLNWC24
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/vlsit/ZhangFZSKLZLNWC24
Dong Zhang, Yang Feng, Zijie Zheng, Chen Sun, Qiwen Kong, Gan Liu, Zuopu Zhou, Gengchiau Liang, Kai Ni, Jixuan Wu, Jiezhi Chen, Xiao Gong:
Unveiling Cryogenic Performance (4 to 300 K) Towards Ultra-Thin Ferroelectric HZO: Novel Kinetic Barrier Engineering and Underlying Mechanism. VLSI Technology and Circuits 2024: 1-2

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.