"Performance of C6H8O7-treated and H- and Cl-passivated Ge-MOS-capacitances ..."

Linda A. Hänel et al. (2018)

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DOI: 10.23919/MIPRO.2018.8400005

access: closed

type: Conference or Workshop Paper

metadata version: 2025-11-09

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Linda A. Hänel, Yasmine Elogail, Daniel Schwarz, Inga A. Fischer, Jörg Schulze:
Performance of C6H8O7-treated and H- and Cl-passivated Ge-MOS-capacitances on Ge-virtual-substrate on Si(001). MIPRO 2018: 27-31

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