"Role of Defects in the Reliability of HfO2/Si-Based Spacer Dielectric ..."

Chen Wu et al. (2019)

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DOI: 10.1109/IRPS.2019.8720534

access: closed

type: Conference or Workshop Paper

metadata version: 2026-01-04

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Chen Wu, Adrian Vaisman Chasin, Andrea Padovani, Alicja Lesniewska, Steven Demuynck, Kris Croes:
Role of Defects in the Reliability of HfO2/Si-Based Spacer Dielectric Stacks for Local Interconnects. IRPS 2019: 1-6

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