"Bias Temperature Instability Reliability in Stacked Gate-All-Around ..."

Miaomiao Wang et al. (2019)

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DOI: 10.1109/IRPS.2019.8720573

access: closed

type: Conference or Workshop Paper

metadata version: 2023-06-28

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Miaomiao Wang, Jingyun Zhang, Huimei Zhou, Richard G. Southwick, Robin Hsin Kuo Chao, Xin Miao, Veeraraghavan S. Basker, Tenko Yamashita, Dechao Guo, Gauri Karve, Huiming Bu, James H. Stathis:
Bias Temperature Instability Reliability in Stacked Gate-All-Around Nanosheet Transistor. IRPS 2019: 1-6

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