"Separation of interface states and electron trapping for hot carrier ..."

Miaomiao Wang et al. (2015)

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DOI: 10.1109/IRPS.2015.7112727

access: closed

type: Conference or Workshop Paper

metadata version: 2023-06-28

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Miaomiao Wang, Zuoguang Liu, Tenko Yamashita, James H. Stathis, Chia-Yu Chen:
Separation of interface states and electron trapping for hot carrier degradation in ultra-scaled replacement metal gate n-FinFET. IRPS 2015: 4

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