"Experimental Implementation of 8.9Kgate Stress Monitor in 28nm MCU Along ..."

Kan Takeuchi et al. (2019)

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DOI: 10.1109/IRPS.2019.8720583

access: closed

type: Conference or Workshop Paper

metadata version: 2019-05-31

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Kan Takeuchi, Masaki Shimada, Shinya Konishi, Daisuke Oshida, Naoya Ota, Takashi Yasumasu, Koji Shibutani, Tomohiro Iwashita, Tetsuya Kokubun, Fumio Tsuchiya:
Experimental Implementation of 8.9Kgate Stress Monitor in 28nm MCU Along with Safety Software Library for IoT Device Maintenance. IRPS 2019: 1-7

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