"Characterization of Slow Traps in SiGe MOS Interfaces by TiN/Y2O3 Gate Stacks."

Tsung-En Lee et al. (2021)

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DOI: 10.1109/IRPS46558.2021.9405189

access: closed

type: Conference or Workshop Paper

metadata version: 2025-03-03

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Tsung-En Lee, Kasidit Toprasertpong, Mitsuru Takenaka, Shinichi Takagi:
Characterization of Slow Traps in SiGe MOS Interfaces by TiN/Y2O3 Gate Stacks. IRPS 2021: 1-4

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