"Localized Layout Effect Related Reliability Approach in 8nm FinFETs ..."

Hai Jiang et al. (2019)

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DOI: 10.1109/IRPS.2019.8720409

access: closed

type: Conference or Workshop Paper

metadata version: 2021-10-14

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Hai Jiang, Hyun-Chul Sagong, Jinju Kim, Junekyun Park, Sangchul Shin, Sangwoo Pae:
Localized Layout Effect Related Reliability Approach in 8nm FinFETs Technology: From Transistor to Circuit. IRPS 2019: 1-5

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