"Reliability of an Al2O3/SiO2MIM Capacitor for 180nm (3.3V) Technology."

Jeff Gambino et al. (2019)

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DOI: 10.1109/IRPS.2019.8720443

access: closed

type: Conference or Workshop Paper

metadata version: 2019-05-31

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  - https://dblp.org/rec/conf/irps/GambinoAHPSTK19
Jeff Gambino, Derryl D. J. Allman, Gavin D. R. Hall, D. Price, L. Sheng, R. Takada, Y. Kanuma:
Reliability of an Al2O3/SiO2MIM Capacitor for 180nm (3.3V) Technology. IRPS 2019: 1-5

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