"Impacts of Depth and Lateral Profiles of Fluorine Atoms in Gate Oxide ..."

Shuntaro Fujii et al. (2021)

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DOI: 10.1109/IRPS46558.2021.9405217

access: closed

type: Conference or Workshop Paper

metadata version: 2021-10-14

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Shuntaro Fujii, Shohei Hamada, Tatsushi Yagi, Isao Maru, Shogo Katsuki, Toshiro Sakamoto, Atsushi Okamoto, Soichi Morita, Tsutomu Miyazaki:
Impacts of Depth and Lateral Profiles of Fluorine Atoms in Gate Oxide Films on Reliability. IRPS 2021: 1-5

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