"Fringe Gate Leakage of 28nm HK/MG nMOSFETs with Nitridation Treatments."

De-Cheng Zhang et al. (2020)

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DOI: 10.1109/ICKII50300.2020.9318939

access: closed

type: Conference or Workshop Paper

metadata version: 2022-10-02

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De-Cheng Zhang, Ching-Chuan Chou, Ho-Hsiang Chen, Shang-Ze Chen, Jian-Ming Chen, Hui-Yun Bor, Wen-How Lan, Mu-Chun Wang:
Fringe Gate Leakage of 28nm HK/MG nMOSFETs with Nitridation Treatments. ICKII 2020: 1-3

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