"Junction Integrity for 28nm High-k nMOSFETs with Thermal Stress."

Yu-Chen Lin et al. (2020)

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DOI: 10.1109/ICKII50300.2020.9318948

access: closed

type: Conference or Workshop Paper

metadata version: 2025-04-01

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Yu-Chen Lin, Kai-Chun Zhan, Ji-Min Zhang, Jian-Ming Chen, Cheng-Hsun-Tony Chang, Shea-Jue Wang, Mu-Chun Wang:
Junction Integrity for 28nm High-k nMOSFETs with Thermal Stress. ICKII 2020: 64-66

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