"Q-factor Integrity of 28nm-node High-k Gate Dielectric."

Ying-Jun Deng et al. (2020)

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DOI: 10.1109/ICKII50300.2020.9318772

access: closed

type: Conference or Workshop Paper

metadata version: 2022-10-02

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Ying-Jun Deng, Hao-Lun Hu, Yu-Han Liang, Jian-Ming Chen, Ching-Chuan Chou, Shea-Jue Wang, Mu-Chun Wang:
Q-factor Integrity of 28nm-node High-k Gate Dielectric. ICKII 2020: 71-73

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