"Patterning Aware Design Optimization of Selective Etching in N5 and Beyond."

Yibo Lin et al. (2017)

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DOI: 10.1109/ICCD.2017.72

access: closed

type: Conference or Workshop Paper

metadata version: 2023-03-23

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Yibo Lin, Peter Debacker, Darko Trivkovic, Ryoung-Han Kim, Praveen Raghavan, David Z. Pan:
Patterning Aware Design Optimization of Selective Etching in N5 and Beyond. ICCD 2017: 415-418

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