"Genetic Algorithms to Improve Mask and Illumination Geometries in ..."

Tim Fühner et al. (2004)

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DOI: 10.1007/978-3-540-24653-4_22

access: closed

type: Conference or Workshop Paper

metadata version: 2022-10-02

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  - conf/evoW/FuhnerEFTK04
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Tim Fühner, Andreas Erdmann, Richárd Farkas, Bernd Tollkühn, Gabriella Kókai:
Genetic Algorithms to Improve Mask and Illumination Geometries in Lithographic Imaging Systems. EvoWorkshops 2004: 208-218

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