"Reliability of Ferroelectric HfO2-based Memories: From MOS Capacitor to FeFET."

Ava J. Tan et al. (2020)

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DOI: 10.1109/DRC50226.2020.9135148

access: closed

type: Conference or Workshop Paper

metadata version: 2020-07-27

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Ava J. Tan, Li-Chen Wang, Yu-Hung Liao, Jong-Ho Bae, Chenming Hu, Sayeef S. Salahuddin:
Reliability of Ferroelectric HfO2-based Memories: From MOS Capacitor to FeFET. DRC 2020: 1-2

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