"Performance Investigation of Uniaxially Tensile Stressed Ge n-FinFETs ..."

Ran Cheng et al. (2019)

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DOI: 10.1109/ASICON47005.2019.8983454

access: closed

type: Conference or Workshop Paper

metadata version: 2020-02-12

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Ran Cheng, Ming Tian, Changfeng Wang, Zhimei Cai, Jie Zhang, Yan-Yan Zhang, Yi Zhao:
Performance Investigation of Uniaxially Tensile Stressed Ge n-FinFETs Formed on Biaxially Strained GeOI Substrates And Its Impact On Ge CMOS Inverters. ASICON 2019: 1-4

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