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"Variation Analysis of Interconnect Capacitance and Process Corner in ..."
Zhimei Cai et al. (2019)
- Zhimei Cai, Zhiyong Han, Ming Tian, Changfeng Wang, Xiaoming Hu, Ran Cheng, Yi Zhao:

Variation Analysis of Interconnect Capacitance and Process Corner in Advanced CMOS Process with Double Patterning Technology. ASICON 2019: 1-4

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