"Spectroscopic ellipsometry (SE) based real-time control of CF4 ..."

Baris Fidan et al. (2000)

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DOI: 10.1109/ACC.2000.876974

access: closed

type: Conference or Workshop Paper

metadata version: 2023-04-29

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Baris Fidan, Tyler Parent, I. G. Rosen, Anupam Madhukar:
Spectroscopic ellipsometry (SE) based real-time control of CF₄/O₂ plasma etching of silicon nitride. ACC 2000: 4006-4010

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