"Development of high-quality low-temperature (≤ 120°C) PECVD-SiN ..."

Hiroshi Taka et al. (2015)

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DOI: 10.1109/3DIC.2015.7334600

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-21

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Hiroshi Taka, Katsumasa Suzuki, Norihiro Tsujioka, Shoichi Murakami:
Development of high-quality low-temperature (≤ 120°C) PECVD-SiN films by organosilane. 3DIC 2015: TS8.2.1-TS8.2.4

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