"Process Development for a Novel Low Loss and Non-PFAS Photo Imageable ..."

Hamideh Jafarpoorchekab et al. (2024)

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DOI: 10.1109/3DIC63395.2024.10830178

access: closed

type: Conference or Workshop Paper

metadata version: 2025-01-23

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Hamideh Jafarpoorchekab, Xiao Sun, Angel Uruena, Siddhartha Sinha, Nelson Pinho, Andy Miller, Nadine Collaert:
Process Development for a Novel Low Loss and Non-PFAS Photo Imageable Dielectric for RF Silicon Interposer Applications. 3DIC 2024: 1-6

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