Impact of Al-based Dipole Formation on Gate Stack Integrity and Reliability.

Wed, 01 Jan 2025 00:00:00 +0100

Bruno Coppolelli, Davide Cornigli, Zheyuan Chen, Andrea Padovani, Sara Vecchi, Yanliu Dang, Luc Thomas, Luca Vandelli, Jianxin Lei, Naomi Yoshida, Renu Whig, Federico Nardi, Gaurav Thareja, Luca Larcher, Milan Pesic:
Impact of Al-based Dipole Formation on Gate Stack Integrity and Reliability. IRPS 2025: 1-8